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ASML's July 15 press release, corroborated by Reuters and Wccftech, confirms Intel Foundry is the first to enter high-volume manufacturing of Panther Lake processors using High-NA EUV on its 18A node.

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Home/Tech/Intel Ships First High-NA EUV Logic Product for Panther Lake
VERIFIEDBy Xavier Rivera· ·1 min read

Intel Ships First High-NA EUV Logic Product for Panther Lake

ASML confirmed on July 15 that Intel Foundry shipped the first high-volume logic product made with High-NA EUV lithography for Panther Lake. The milestone advances commercial readiness of the technology while ASML prepares TSMC and Samsung for wider adoption.

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Intel Ships First High-NA EUV Logic Product for Panther Lake
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TL;DRAI · 60 sec read

Intel Foundry ships the first high-volume logic product manufactured using High-NA EUV lithography for its Panther Lake processors. ASML confirmed this commercial milestone on July 15. The milestone advances semiconductor manufacturing precision and positions Intel ahead of TSMC and Samsung as ASML prepares them for the technology's next phase of adoption.

ASML has confirmed that Intel Foundry is the first company to ship a high-volume logic product manufactured using High-NA EUV lithography.

Intel achieves commercial milestone with High-NA EUV. The confirmation came on July 15 as Intel qualifies the technology for its Panther Lake processors. This marks the first commercial readiness of ASML's most advanced lithography system in high-volume logic production.
This marks the first commercial readiness of ASML's most advanced lithography system in high-volume logic production.

The milestone positions Intel Foundry ahead in the deployment of High-NA EUV tools.

ASML advances next-wave preparation for TSMC and Samsung. The Dutch equipment maker is preparing TSMC and Samsung for the subsequent phase of High-NA EUV adoption. These efforts follow Intel's qualification and aim to broaden industry use of the technology.
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ASML's High-NA EUV lithography represents a key advancement in semiconductor manufacturing precision. The system enables finer patterning required for future chip generations. Intel's Panther Lake chips now incorporate this capability in production volumes.
Intel's Panther Lake chips now incorporate this capability in production volumes.

Industry context centers on logic chip manufacturing leadership. Intel Foundry's achievement underscores its progress in process technology amid competition from foundry peers. The July 15 confirmation highlights the transition from development to commercial shipment for High-NA EUV.
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TSMC and Samsung are positioned to follow Intel's lead in integrating the lithography tools. Their preparation by ASML indicates an accelerating rollout across major semiconductor players. The development signals broader availability of High-NA EUV for logic products in coming cycles.
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